Mr. Jeffrey W. Ritchison
Yield Metrology Analog Technology Development -MEM at
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 5, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Etching, Inspection, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology

PROCEEDINGS ARTICLE | July 16, 2002
Proc. SPIE. 4689, Metrology, Inspection, and Process Control for Microlithography XVI
KEYWORDS: Carbon, Electron beams, Defect detection, Metals, Reliability, Resistance, Inspection, Scanning electron microscopy, Transistors, Semiconducting wafers

PROCEEDINGS ARTICLE | June 2, 2000
Proc. SPIE. 3998, Metrology, Inspection, and Process Control for Microlithography XIV
KEYWORDS: Defect detection, Imaging systems, Sensors, Particles, Inspection, Scanning electron microscopy, Semiconducting wafers, Yield improvement, Tin, Chemical mechanical planarization

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