Mr. Jeffrey W. Roberts
at n&k Technology Inc
SPIE Involvement:
Author
Publications (3)

PROCEEDINGS ARTICLE | April 1, 2013
Proc. SPIE. 8679, Extreme Ultraviolet (EUV) Lithography IV
KEYWORDS: Amorphous silicon, Oxides, Reflectivity, Chromium, Transmittance, Photomasks, Extreme ultraviolet, Tantalum, Molybdenum, Ruthenium

PROCEEDINGS ARTICLE | December 11, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Metrology, Gemini Observatory, Silica, Etching, Reflectivity, Atomic force microscopy, Optical metrology, Transmittance, Critical dimension metrology, Beam propagation method

PROCEEDINGS ARTICLE | September 30, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Lithography, Metrology, Gemini Observatory, Data modeling, Reflectivity, Magnetism, Nondestructive evaluation, Scanning electron microscopy, Transmittance, Beam propagation method

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