Jeffrey R. Strahan
Graduate Student at Univ of Texas at Austin
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 31, 2010
Proc. SPIE. 7639, Advances in Resist Materials and Processing Technology XXVII
KEYWORDS: Lithography, Data modeling, Calibration, Polymers, Diffusion, Monte Carlo methods, Molecular interactions, Line edge roughness, Stochastic processes, Systems modeling

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Polymers, Extreme ultraviolet, Polymethylmethacrylate, Electron beam lithography, Fluorine, Magnesium, Photomasks, Liquids, Chemistry, Lithography

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Polymethylmethacrylate, Polymers, Photons, Molecules, Quantum efficiency, Extreme ultraviolet, Line width roughness, Absorbance, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | April 1, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Reticles, Data modeling, Diffusion, Diagnostics, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Nanoimprint lithography, Photoresist processing

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