Dr. Jelle Vandereyken
at imec
SPIE Involvement:
Publications (19)

Proceedings Article | 10 April 2024 Presentation + Paper
Andreia Santos, Wesley Zanders, Elke Caron, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas Guerrero, Masahiko Harumoto, Tsuyoshi Mitsuashi
Proceedings Volume 12957, 1295717 (2024) https://doi.org/10.1117/12.3010506
KEYWORDS: Spin on carbon materials, Sustainability, Thermography, Power consumption, Lithography, Displays, Semiconductors, Optical lithography, Materials processing, Extreme ultraviolet

Proceedings Article | 9 April 2024 Presentation + Paper
Proceedings Volume 12957, 129570Z (2024) https://doi.org/10.1117/12.3010976
KEYWORDS: Semiconducting wafers, Particles, Scanning electron microscopy, Extreme ultraviolet lithography, Scanners, Photoresist materials, Displays, Deformation

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 1295720 (2024) https://doi.org/10.1117/12.3011129
KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Line width roughness, Image processing, Standards development, Line edge roughness, Film thickness, Optical lithography, Metal oxides, Critical dimension metrology

Proceedings Article | 9 April 2024 Paper
Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Elke Caron, Andreia Santos, Masahiko Harumoto, Douglas Guerrero
Proceedings Volume 12957, 129572G (2024) https://doi.org/10.1117/12.3012855
KEYWORDS: Power consumption, Etching, Spin on carbon materials, Semiconductors, Optical lithography, Line edge roughness, Thermography, Extreme ultraviolet lithography, Lithography, Industry

Proceedings Article | 1 December 2023 Presentation + Paper
Proceedings Volume PC12750, PC127500Q (2023) https://doi.org/10.1117/12.2687017
KEYWORDS: Semiconducting wafers, Contamination, Scanners, Optical lithography, Particles, Extreme ultraviolet, Displays, Extreme ultraviolet lithography, Inspection, Critical dimension metrology

Showing 5 of 19 publications
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