Dr. Jen-Shiang Wang
Senior Engineer at ASML San Jose
SPIE Involvement:
Author
Publications (10)

PROCEEDINGS ARTICLE | March 22, 2018
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

PROCEEDINGS ARTICLE | March 24, 2017
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Plasma etching, Optical proximity correction, Reactive ion etching, Plasma

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Point spread functions, Electron beams, Data modeling, Scattering, Chromium, Monte Carlo methods, Photomasks, Extreme ultraviolet, Tantalum, Process modeling

PROCEEDINGS ARTICLE | May 27, 2010
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Metrology, Optical lithography, Scattering, Manufacturing, Time metrology, Photomasks, Extreme ultraviolet, Computational lithography, Critical dimension metrology, EUV optics

PROCEEDINGS ARTICLE | September 23, 2009
Proc. SPIE. 7488, Photomask Technology 2009
KEYWORDS: Wafer-level optics, Lithography, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Printing, Photomasks, Semiconducting wafers

PROCEEDINGS ARTICLE | May 11, 2009
Proc. SPIE. 7379, Photomask and Next-Generation Lithography Mask Technology XVI
KEYWORDS: Wafer-level optics, Lithography, Defect detection, Sensors, Scanners, Inspection, Image resolution, Optical inspection, Photomasks, Semiconducting wafers

Showing 5 of 10 publications
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