Dr. Jen-Shiang Wang
Senior Engineer at ASML
SPIE Involvement:
Publications (11)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Stochastic processes, Pattern recognition, Semiconducting wafers, Wafer inspection, Inspection, Defect detection, Metrology, Failure analysis, Data modeling, Calibration

Proceedings Article | 22 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Optical proximity correction, Scanning electron microscopy, Image processing, Time metrology, Critical dimension metrology, Semiconducting wafers, Error analysis

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Etching, Optical lithography, Optical proximity correction, Calibration, Reactive ion etching, Plasma, Plasma etching

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Extreme ultraviolet, Data modeling, Photomasks, Scattering, Monte Carlo methods, Point spread functions, Process modeling, Electron beams, Tantalum, Chromium

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Photomasks, Critical dimension metrology, Extreme ultraviolet, Manufacturing, Metrology, Time metrology, EUV optics, Computational lithography, Scattering, Optical lithography

Showing 5 of 11 publications
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