Jen-Yi Wuu
at ASML Silicon Valley
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 15 March 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Photomasks, Double patterning technology, Machine learning, Critical dimension metrology, Detection and tracking algorithms, Image classification, Optimization (mathematics), Optical lithography, Etching

Proceedings Article | 5 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Machine learning, Lithography, Databases, Image classification, Phase modulation, Calibration, Manufacturing, Tolerancing, Design for manufacturability, Detection and tracking algorithms

Proceedings Article | 13 March 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Computer programming, Data modeling, Optics manufacturing, Resolution enhancement technologies, Manufacturing, Model-based design, Library classification systems, Visualization, Optical lithography

Proceedings Article | 17 October 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Instrument modeling, TCAD, Device simulation, Transistors, Ions, Resolution enhancement technologies, Data modeling, Silicon, Process modeling, Computer simulations

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