Jen-Yi Wuu
at ASML San Jose
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 15, 2012
Proc. SPIE. 8327, Design for Manufacturability through Design-Process Integration VI
KEYWORDS: Lithography, Optical lithography, Detection and tracking algorithms, Etching, Photomasks, Machine learning, Image classification, Double patterning technology, Critical dimension metrology, Optimization (mathematics)

PROCEEDINGS ARTICLE | April 5, 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Lithography, Detection and tracking algorithms, Phase modulation, Calibration, Databases, Manufacturing, Machine learning, Image classification, Tolerancing, Design for manufacturability

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Lithography, Optical lithography, Data modeling, Visualization, Manufacturing, Computer programming, Optics manufacturing, Model-based design, Resolution enhancement technologies, Library classification systems

PROCEEDINGS ARTICLE | October 17, 2008
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Data modeling, Ions, Silicon, Computer simulations, Transistors, TCAD, Process modeling, Device simulation, Resolution enhancement technologies, Instrument modeling

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Back to Top