Dr. Jengyi Yu
at Lam Research Corp
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10963, Advanced Etch Technology for Nanopatterning VIII
KEYWORDS: Metrology, Optical lithography, Etching, Computer simulations, Time metrology, Bridges, Extreme ultraviolet lithography, Photoresist processing, Stochastic processes, Focus stacking software

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Etching, Silicon, Scanning electron microscopy, Image filtering, Line width roughness, Line edge roughness, Photoresist processing, Standards development

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

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