Dr. Jennifer Church
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
EUV Lithography , Advanced Patterning
Profile Summary

I started at IBM in 2018 as a lithography engineer. My area of expertise is in EUV patterning and characterization - with a focus on EUV stochastics. I develop and apply various characterization methods to understand the modulation of stochastic events by different processes and materials.
Publications (19)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295305 (2024) https://doi.org/10.1117/12.3012023
KEYWORDS: Line width roughness, Light sources and illumination, Nanoimprint lithography, Optical lithography, Line edge roughness, Etching, Transistors, Extreme ultraviolet, Reactive ion etching, Extreme ultraviolet lithography

Proceedings Article | 30 April 2023 Presentation
Proceedings Volume 12496, 124960V (2023) https://doi.org/10.1117/12.2657650
KEYWORDS: Metrology, Scanning electron microscopy, Electron microscopes, Extreme ultraviolet, Time metrology, Stochastic processes, Statistical analysis, Critical dimension metrology, Inspection

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530C (2022) https://doi.org/10.1117/12.2614219
KEYWORDS: Critical dimension metrology, Metrology, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Process modeling, Data modeling, Photomasks, Lithography, Extreme ultraviolet lithography

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12053, 1205306 (2022) https://doi.org/10.1117/12.2613102
KEYWORDS: Stochastic processes, Inspection, Extreme ultraviolet, Metrology, Line width roughness, Etching, Line edge roughness, Critical dimension metrology, Yield improvement, Photomasks

Proceedings Article | 17 November 2021 Presentation + Paper
Proceedings Volume 11854, 118540X (2021) https://doi.org/10.1117/12.2600877
KEYWORDS: Line edge roughness, Stochastic processes, Inspection, Modulation, Critical dimension metrology, Semiconducting wafers, Plasma, Defect inspection, Optical inspection, Extreme ultraviolet lithography

Showing 5 of 19 publications
Conference Committee Involvement (2)
International Conference on Extreme Ultraviolet Lithography 2024
29 September 2024 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2023
2 October 2023 | Monterey, California, United States
Course Instructor
NON-SPIE: Advisory Engineer
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