Dr. Jennifer Church
at IBM Thomas J Watson Research Ctr
SPIE Involvement:
Author
Profile Summary

I started at IBM in 2018 as a lithography engineer. My area of expertise is in EUV patterning and characterization - with a focus on EUV stochastics. I apply various characterization methods to understand the modulation of stochastic events by different processes and materials.
Publications (14)

Proceedings Article | 26 February 2021 Presentation + Paper
Proc. SPIE. 11615, Advanced Etch Technology and Process Integration for Nanopatterning X
KEYWORDS: Etching, Critical dimension metrology, Optical lithography, Back end of line, Semiconducting wafers, Logic, Lithography, Dielectrics

Proceedings Article | 24 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Optical lithography, Etching, Stochastic processes, Semiconducting wafers, Resolution enhancement technologies, Extreme ultraviolet lithography, Scanners, Inspection, Source mask optimization, Photoresist processing

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11611, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV
KEYWORDS: Metrology, Line edge roughness, Gallium arsenide, Transistors, Semiconductors, Nondestructive evaluation, Nanotechnology, Manufacturing, Machine learning, Logic

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Extreme ultraviolet lithography, Roads, Extreme ultraviolet, Optical lithography, Yield improvement, Transistors, Printing, Modulation, Metals, Materials processing

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Showing 5 of 14 publications
Conference Committee Involvement (1)
SPIE Advanced Lithography
23 February 2020 |
Course Instructor
NON-SPIE: Advisory Engineer
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