Jennifer M. Fullam
at IBM Thomas J. Watson Research Ctr.
SPIE Involvement:
Publications (7)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume PC12956, PC129560E (2024)
KEYWORDS: Optical lithography, Lithography, Coating thickness, Semiconducting wafers, Plating, Photoresist processing, Dielectrics, Coating

Proceedings Article | 13 June 2022 Presentation
Proceedings Volume PC12053, PC120530C (2022)
KEYWORDS: Critical dimension metrology, Metrology, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Process modeling, Data modeling, Photomasks, Lithography, Extreme ultraviolet lithography

Proceedings Article | 2 April 2020 Presentation + Paper
Proceedings Volume 11325, 1132514 (2020)
KEYWORDS: Atomic force microscopy, Metrology, Transmission electron microscopy, Gallium arsenide, 3D metrology, Measurement devices, Scanning electron microscopy, Semiconducting wafers, Visualization, X-ray optics

Proceedings Article | 20 March 2020 Presentation + Paper
Proceedings Volume 11325, 113250T (2020)
KEYWORDS: Line edge roughness, Metrology, Atomic force microscopy, Extreme ultraviolet, Semiconducting wafers, Scatterometry, Critical dimension metrology, Stochastic processes, Calibration, Scanning electron microscopy

Proceedings Article | 28 April 2011 Paper
Jennifer Fullam, Carol Boye, Theodorus Standaert, John Gaudiello, Derek Tomlinson, Hong Xiao, Wei Fang, Xu Zhang, Fei Wang, Long Ma, Yan Zhao, Jack Jau
Proceedings Volume 7971, 79710Y (2011)
KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Inspection, Electron microscopes, Defect inspection, Data acquisition, Etching, Field effect transistors

Showing 5 of 7 publications
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