Jennifer L. Morningstar
Overlay Engineer at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Optical lithography, Imaging systems, Manufacturing, Scanning electron microscopy, Photomasks, Semiconducting wafers, Overlay metrology, Imaging metrology

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Calibration, Manufacturing, Photomasks, Semiconducting wafers, Optical calibration, Optics manufacturing, Overlay metrology, Standards development

Proceedings Article | 5 April 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Etching, Inspection, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Yield improvement, Overlay metrology

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical lithography, Visualization, Inspection, Diagnostics, Process control, Semiconducting wafers, Tolerancing, Overlay metrology, Back end of line

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Metrology, Optical lithography, Image processing, Manufacturing, Optical alignment, Semiconducting wafers, Tolerancing, Overlay metrology, Back end of line, Front end of line

Showing 5 of 6 publications
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