Jennifer Shumway
Senior Design Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 January 2018
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Monochromatic aberrations, Reticles, Optical lithography, Calibration, Scanners, Software development, Semiconducting wafers, Current controlled current source

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