Dr. Jens Busch
at GLOBALFOUNDRIES Dresden
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Calibration, Metals, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data

PROCEEDINGS ARTICLE | April 2, 2011
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Reticles, Image processing, Scanners, Manufacturing, Thermal effects, Process control, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | April 2, 2010
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Control systems, Scatterometry, Time metrology, Process control, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | May 27, 2009
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Metrology, Logic, Optical lithography, Oscillators, Etching, Scanners, Photomasks, Line width roughness, Transistors, Semiconducting wafers

PROCEEDINGS ARTICLE | April 4, 2007
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Error analysis, Image registration, Pellicles, Photomasks, Semiconducting wafers, Overlay metrology

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Polishing, Metrology, Data modeling, Scanners, Manufacturing, Optical alignment, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Showing 5 of 6 publications
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