Dr. Jens Schneider
Principal Lithography
SPIE Involvement:
Area of Expertise:
Lithography , Litho Process Development , Litho Materials , Innovation Topics
Publications (12)

Proceedings Article | 19 September 2018 Paper
Jens Schneider, Dieter Kaiser, Nicolo Morgana, Marcel Heller, Henning Feick
Proceedings Volume 10775, 107750W (2018) https://doi.org/10.1117/12.2326006
KEYWORDS: Photomasks, Photoresist processing, Grayscale lithography, Lithography, Semiconductor manufacturing, Manufacturing, Ions, Semiconducting wafers, Doping, Ion implantation

Proceedings Article | 28 March 2014 Paper
Marcus Dankelmann, Markus Czekalla, Heiko Estel, Jens Hahn, Bee Kim Hong, Mario Lamm, Eric Neubert, Michael Renner, Rainer Scheibel, Maik Stegemann, Jens Schneider
Proceedings Volume 9054, 90540P (2014) https://doi.org/10.1117/12.2045307
KEYWORDS: Etching, Oxygen, Photoresist processing, Semiconducting wafers, Photomasks, Metals, Plasma, Tin, Critical dimension metrology, Chemistry

Proceedings Article | 12 April 2013 Paper
Marcel Heller, Dieter Kaiser, Maik Stegemann, Georg Holfeld, Nicoló Morgana, Jens Schneider, Daniel Sarlette
Proceedings Volume 8683, 868310 (2013) https://doi.org/10.1117/12.2008847
KEYWORDS: Etching, Oxides, Photoresist materials, Photomasks, Semiconducting wafers, Reactive ion etching, Grayscale lithography, Lithography, Ions, Atomic force microscopy

Proceedings Article | 29 March 2013 Paper
Jens Schneider, Henning Feick, Dieter Kaiser, Marcel Heller, Daniel Sarlette
Proceedings Volume 8683, 86831P (2013) https://doi.org/10.1117/12.2008444
KEYWORDS: Photomasks, Grayscale lithography, Lithography, Doping, Silicon, Ion implantation, Photoresist processing, Ions, Semiconducting wafers, Optical lithography

Proceedings Article | 20 April 2011 Paper
Jens Schneider, Susanne Volkland, Ulrike Feldner, Lincoln O'Riain, Dirk Peters, Felix Braun, Lothar Brencher, Barbara Hornig, Oliver Luxenhofer, Daniel Sarlette
Proceedings Volume 7971, 797128 (2011) https://doi.org/10.1117/12.879431
KEYWORDS: Etching, Contamination, Metals, Lithography, Reliability, Dielectric filters, Semiconducting wafers, Particles, Bottom antireflective coatings, Dielectrics

Showing 5 of 12 publications
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