Jeongsu Park
at SK Hynix Inc
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 27 March 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Semiconductors, Optical lithography, Etching, Inspection, Process control, Photoresist processing, Semiconducting wafers, Tolerancing, System on a chip, Factor analysis, Plasma

Proceedings Article | 18 March 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Metrology, Image compression, Resistance, Inspection, Control systems, Electroluminescence, Photomasks, Nanoimprint lithography, Critical dimension metrology, Line edge roughness, Semiconducting wafers

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