Jeong-Geun Park
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 5 April 2011
Proc. SPIE. 7974, Design for Manufacturability through Design-Process Integration V
KEYWORDS: Calibration, Etching, Control systems, Scanning electron microscopy, Photomasks, Transistors, Critical dimension metrology, Performance modeling, Personal protective equipment, Instrument modeling

Proceedings Article | 24 March 2008
Proc. SPIE. 6922, Metrology, Inspection, and Process Control for Microlithography XXII
KEYWORDS: Carbon, Metrology, Coating, Scanning electron microscopy, Optical inspection, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tin, Defect inspection

Proceedings Article | 26 March 2007
Proc. SPIE. 6520, Optical Microlithography XX
KEYWORDS: Optical lithography, Polarization, Chromium, 3D modeling, Near field, Transmittance, Photomasks, Optical proximity correction, Binary data, 3D image processing

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top