Dr. Jeong-Ho Yeo
Vice President at SAMSUNG Electro-Mechanics Co Ltd
SPIE Involvement:
Conference Program Committee | Author
Area of Expertise:
Lithography , Wafer Inspection , Metrology
Publications (37)

Proceedings Article | 17 April 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Deep ultraviolet, Etching, Scanners, Particles, Reflectivity, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 18 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Calibration, Atomic force microscopy, Scanning electron microscopy, Spectroscopic ellipsometry, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Proceedings Article | 10 April 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Lithography, Electronics, Scanners, Fourier transforms, Control systems, Process control, Semiconducting wafers, Overlay metrology, Instrument modeling

SPIE Journal Paper | 18 March 2013
JM3 Vol. 12 Issue 02
KEYWORDS: Photomasks, Reticles, Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Extreme ultraviolet, Cadmium, Reflectivity, Scanners, Semiconductors

Proceedings Article | 8 November 2012
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Semiconductors, Reticles, Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers

Showing 5 of 37 publications
Conference Committee Involvement (6)
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
Showing 5 of 6 Conference Committees
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