Jeong Hoon Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | September 29, 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Metals, Image processing, Manufacturing, Photomasks, Optical proximity correction, Model-based design, Instrument modeling

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Cadmium, Scanners, Reflectivity, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Critical dimension metrology, Optical calibration, EUV optics

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Lithography, Light sources, Etching, Scanners, Resistance, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Optical proximity correction, Semiconducting wafers

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Lithography, Point spread functions, Cadmium, Fractal analysis, Photomasks, Extreme ultraviolet, Optical proximity correction, Convolution, Modulation transfer functions, Critical dimension metrology

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