Dr. Jeong-Yun Lee
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Strong Expert in High Reliable Dry Etching Process , FEOL etching , RMG , Plasma Damage , Source Drain etching , Strained Engineering
Publications (9)

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Dry etching, Manufacturing, Chromium, Oxygen, Scanning electron microscopy, Photomasks, Mask making, Critical dimension metrology, Chlorine

Proceedings Article | 17 December 2003
Proc. SPIE. 5256, 23rd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Etching, Polymers, Particles, Ions, Chemistry, Photomasks, Aluminum, Plasma etching, Critical dimension metrology, Plasma

Proceedings Article | 28 August 2003
Proc. SPIE. 5130, Photomask and Next-Generation Lithography Mask Technology X
KEYWORDS: Etching, Quartz, Dry etching, Ions, Manufacturing, Chromium, Photomasks, Integrated circuits, Resolution enhancement technologies, Plasma

Proceedings Article | 12 June 2003
Proc. SPIE. 5039, Advances in Resist Technology and Processing XX
KEYWORDS: Lithography, Refractive index, Optical lithography, Optical properties, Etching, Reflectivity, Chemical reactions, Critical dimension metrology, Line edge roughness, Bottom antireflective coatings

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Wafer-level optics, Reticles, Error analysis, Fourier transforms, Image acquisition, Photomasks, Convolution, Holmium, Semiconducting wafers, Phase shifts

Proceedings Article | 27 December 2002
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Data modeling, Etching, Error analysis, Quantitative analysis, Photomasks, Integrated circuits, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Chemically amplified resists

Showing 5 of 9 publications
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