Dr. Jeong Yun Yu
Vice President at Samsung SDI
SPIE Involvement:
Author
Publications (6)

PROCEEDINGS ARTICLE | March 27, 2017
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Carbon, Antireflective coatings, Optical lithography, Etching, Silicon, Materials processing, Manufacturing, Resistance, Reflectivity, Chemical vapor deposition, Photoresist materials, Atomic layer deposition, Photomasks, Double patterning technology, System integration, Plasma, Bottom antireflective coatings

PROCEEDINGS ARTICLE | March 4, 2010
Proc. SPIE. 7640, Optical Microlithography XXIII
KEYWORDS: Lithography, Multilayers, Etching, Metals, Reflectivity, Control systems, Line width roughness, Immersion lithography, Logic devices, Back end of line

PROCEEDINGS ARTICLE | April 10, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Interfaces, Silicon, Reflectivity, Control systems, Double patterning technology, Immersion lithography

PROCEEDINGS ARTICLE | April 10, 2009
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Lithography, Multilayers, Optical lithography, Etching, Metals, Reflectivity, Control systems, Line width roughness, Logic devices, Tin

PROCEEDINGS ARTICLE | April 15, 2008
Proc. SPIE. 6923, Advances in Resist Materials and Processing Technology XXV
KEYWORDS: Lithography, Optical lithography, Reflection, Etching, Metals, Reflectivity, Line width roughness, Immersion lithography, Logic devices, Critical dimension metrology

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Polymers, Coating, Chemistry, Manufacturing, Inspection, Reflectivity, Control systems, Photoresist materials, Humidity, Statistical modeling

Showing 5 of 6 publications
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