Dr. Jeong Yun Yu Profile

Dr. Jeong Yun Yu

Vice President at Samsung SDI

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 27 March 2017 Presentation + Paper

Investigation on spin-on hard mask integration

Yushin Park, Seungwook Shin, Yunjun Kim, Seunghyun Kim, Jaebum Lim, Sung Hwan Kim, Hyeonil Jung, Chungheon Lee, Miyeon Han, Sanghak Lim, Jeong Yun Yu

Proceedings Volume 10146, 1014616 (2017) https://doi.org/10.1117/12.2257846

KEYWORDS: System integration, Photoresist materials, Manufacturing, Bottom antireflective coatings, Silicon, Antireflective coatings, Materials processing, Photomasks, Etching, Resistance, Carbon, Reflectivity, Optical lithography, Chemical vapor deposition, Double patterning technology, Atomic layer deposition, Plasma

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Immersion BARC for hyper NA applications II

Yu-Chin Huang, Kai-Lin Chuang, Tsung-Ju Yeh, Steven Wu, Bill Lin, Wen-Liang Huang, Bo-Jou Lu, E. Liu, Chun Chi Yu, Chaoyang Lin, Jeong Yun Yu, Greg Prokopowicz, Sue Ryeon Kim, Sabrina Wong, George Barclay

Proceedings Volume 7640, 76403F (2010) https://doi.org/10.1117/12.848454

KEYWORDS: Reflectivity, Metals, Line width roughness, Logic devices, Multilayers, Etching, Lithography, Control systems, Immersion lithography, Back end of line

Read Abstract +

Proceedings Article | 10 April 2009 Paper

Immersion BARC for hyper NA applications

Wan-Ju Tseng, Wen Liang Huang, Bill Lin, Bo Jou Lu, Tsung Ju Yeh, E. T. Liu, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Sook Lee, Sabrina Wong, Chaoyang Lin, Maurizio Ciambra, Suzanne Coley, David Praseuth, Kathleen O'Connell, George Barclay

Proceedings Volume 7273, 727317 (2009) https://doi.org/10.1117/12.816393

KEYWORDS: Reflectivity, Metals, Multilayers, Etching, Line width roughness, Lithography, Control systems, Optical lithography, Logic devices, Tin

Read Abstract +

Proceedings Article | 10 April 2009 Paper

Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning

Sabrina Wong, Jeong Yun Yu, Sue Ryeon Kim, Mike Mori, Amy Kwok, Kathleen O'Connell, George Barclay, Ki Lyoung Lee, Sung Koo Lee, Cheol Kyu Bok

Proceedings Volume 7273, 727318 (2009) https://doi.org/10.1117/12.816448

KEYWORDS: Reflectivity, Double patterning technology, Immersion lithography, Multilayers, Silicon, Interfaces, Optical lithography, Lithography, Etching, Control systems

Read Abstract +

Proceedings Article | 15 April 2008 Paper

Reflection control for immersion lithography at 45/32-nm nodes

Wan-Ju Tseng, Ruei-Hung Hsu, Shu Huei Hou, Tzu-Huai Tseng, Bill Lin, Chun Chi Yu, Sue Ryeon Kim, Jeong Yun Yu, Gerald Wayton, Maurizio Ciambra, Suzanne Coley, David Praseuth, Nick Pugliano

Proceedings Volume 6923, 69232Z (2008) https://doi.org/10.1117/12.776671

KEYWORDS: Metals, Lithography, Reflectivity, Optical lithography, Line width roughness, Immersion lithography, Reflection, Logic devices, Critical dimension metrology, Etching

Read Abstract +

Proceedings Article | 14 May 2004 Paper

Analysis of solvent effect to control the BARC coating uniformity

Min-Ho Jung, Sangwoong Yoon, Eun-Soon Chung, Beom-Sang Yoo, Jeong Yun Ya, Don Winning, Boo Deuk Kim, Hong Lee, Do Young Kim, Young Hoon Kim, Myungsun Kim, Young Ho Kim, Sang-Mun Chon

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533924

KEYWORDS: Coating, Humidity, Polymers, Statistical modeling, Control systems, Reflectivity, Photoresist materials, Manufacturing, Chemistry, Inspection

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years