As semiconductor micro-fabrication process continues to advance, the size of probing pads also become smaller in a chip. A probe needle contacts each probing pad for electrical test. However, probe needle may incorrectly touch probing pad. Such contact failures damage probing pads and cause qualification problems. In order to detect contact failures, the current system observes the probing marks on pads. Due to a low accuracy of the system, engineers have to redundantly verify the result of the system once more, which causes low efficiency. We suggest an approach for automatic defect detection to solve these problems using image processing and CSVM. We develop significant features of probing marks to classify contact failures more correctly. We reduce 38% of the workload of engineers.