Dr. Jeonghoon Lee
at imec
SPIE Involvement:
Publications (8)

Proceedings Article | 10 April 2024 Poster + Paper
Proceedings Volume PC12953, PC129530Z (2024) https://doi.org/10.1117/12.3011854
KEYWORDS: Critical dimension metrology, Extreme ultraviolet lithography, Optical lithography, Line width roughness, Photoresist materials, Semiconducting wafers, Finite element methods, Printing, Inspection, Cadmium

Proceedings Article | 9 April 2024 Presentation + Paper
Van Tuong Pham, Jeonghoon Lee, Kaushik Sah, Ying-Lin Chen, Seonggil Heo, Soobin Hwang, Kenichi Miyaguchi, Bappaditya Dey, Maria Chistiakova, Peter De Schepper, Philippe Bezard, Sara Paolillo, Danilo De Simone, Hyo Seon Suh, Victor Blanco
Proceedings Volume 12957, 129570V (2024) https://doi.org/10.1117/12.3010934
KEYWORDS: Printing, Extreme ultraviolet, Optical lithography, Etching, Extreme ultraviolet lithography, Design, Cadmium, Source mask optimization, Scanning electron microscopy, Semiconducting wafers

Proceedings Article | 22 November 2023 Presentation
Proceedings Volume PC12750, PC1275004 (2023) https://doi.org/10.1117/12.2687539
KEYWORDS: Error analysis, Defect detection, Manufacturing, Extreme ultraviolet lithography, Extreme ultraviolet, Thermal stability, Temperature control, Simulations, Scanning electron microscopy, Photovoltaics

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12495, 124950A (2023) https://doi.org/10.1117/12.2660413
KEYWORDS: Photomasks, Extreme ultraviolet, Source mask optimization, Resolution enhancement technologies, Optical proximity correction, Lithography, Optical lithography, Capacitors, Semiconducting wafers, SRAF

Proceedings Article | 28 April 2023 Paper
Proceedings Volume 12495, 124950S (2023) https://doi.org/10.1117/12.2660763
KEYWORDS: Optical lithography, Extreme ultraviolet, Optical proximity correction, Design and modelling, SRAF, Semiconducting wafers, Inspection, Source mask optimization, Printing, Electronic design automation

Showing 5 of 8 publications
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