Dr. Jeongjin Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | March 15, 2016
Proc. SPIE. 9780, Optical Microlithography XXIX
KEYWORDS: Near infrared, Optical lithography, Opacity, Sensors, Image processing, Materials processing, Signal processing, Optical alignment, Optics manufacturing, Wafer testing, Overlay metrology

PROCEEDINGS ARTICLE | March 8, 2016
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Diffraction, Metrology, Image processing, Optical testing, Scatterometry, Optical metrology, Critical dimension metrology, Semiconducting wafers, Scatter measurement, Wafer testing, Overlay metrology, Device simulation, Diffraction gratings

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Diffraction, Electronics, Statistical analysis, Metals, Image processing, Error analysis, Semiconducting wafers, Statistical modeling, Overlay metrology, Chemical mechanical planarization

PROCEEDINGS ARTICLE | April 3, 2012
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Data modeling, Scanners, Distortion, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Data corrections, Overlay metrology

PROCEEDINGS ARTICLE | April 20, 2011
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Metrology, Image processing, Scanners, Inspection, Nondestructive evaluation, Signal processing, Photomasks, Photoresist processing, Semiconducting wafers, Overlay metrology

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