Dr. Jeonkyu Lee
at Hynix Semiconductor Inc
SPIE Involvement:
Author
Publications (5)

PROCEEDINGS ARTICLE | April 12, 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Cadmium, Photomasks, Extreme ultraviolet, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, 193nm lithography

PROCEEDINGS ARTICLE | December 14, 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, Image processing, Scanners, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

PROCEEDINGS ARTICLE | March 24, 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Metrology, Interferometers, Inspection, Control systems, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Polarization, Printing, Photomasks, Line width roughness, Optical proximity correction, Line edge roughness, Zirconium, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Lithographic illumination, Interferometers, Metals, Error analysis, Critical dimension metrology, Semiconducting wafers, Yield improvement

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