Dr. Jeonkyu Lee Profile

Dr. Jeonkyu Lee

at SK Hynix Inc

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Author

Publications (6)

Proceedings Article | 26 March 2019 Presentation + Paper

OPC model accuracy study using high volume contour based gauges and deep learning on memory device

Young-Seok Kim, SeIl Lee, Zhenyu Hou, Yiqiong Zhao, Meng Liu, Yunan Zheng, Qian Zhao, Daekwon Kang, Lei Wang, Mark Simmons, Mu Feng, Jun Lang, Byoung-Il Choi, Gilbert Kim, Hakyong Sim, Jongcheon Park, Gyun Yoo, JeonKyu Lee, Sung-woo Ko, Jaeseung Choi, Cheolkyun Kim, Chanha Park

Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII

KEYWORDS: Metrology, Data modeling, Calibration, Scanning electron microscopy, Time metrology, Neural networks, Optical proximity correction, Semiconducting wafers, Instrument modeling

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Proceedings Article | 12 April 2013 Paper

Mask compensation for process flare in 193nm very low k1 lithography

Jeonkyu Lee, Taehyeong Lee, Sangjin Oh, Chunsoo Kang, Jungchan Kim, Jaeseung Choi, Chanha Park, Hyunjo Yang, Donggyu Yim, Munhoe Do, Irene Su, Hua Song, Jung-Hoe Choi, Yongfa Fan, Anthony Wang, Sung-Woo Lee, Robert Boone, Kevin Lucas

Proc. SPIE. 8683, Optical Microlithography XXVI

KEYWORDS: Lithography, Optical lithography, Cadmium, Photomasks, Extreme ultraviolet, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, 193nm lithography

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Proceedings Article | 14 December 2009 Paper

Study of OPC accuracy by illumination source types

Kiho Yang, Daejin Park, Jeonkyu Lee, Sangjin Oh, Jinhyuck Jeon, Taejun You, Chanha Park, Donggyu Yim, Sungki Park

Proc. SPIE. 7520, Lithography Asia 2009

KEYWORDS: Lithography, Data modeling, Polarization, Calibration, Image processing, Scanners, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

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Proceedings Article | 24 March 2006 Paper

Characterizing optical proximity effect difference among exposure tools

Jongkyun Hong, Jeonkyu Lee, Eunsuk Kang, Hyunjo Yang, Donggyu Yim, Jinwoong Kim

Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX

KEYWORDS: Reticles, Metrology, Interferometers, Inspection, Control systems, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

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Proceedings Article | 15 March 2006 Paper

High NA polarized light lithography for 0.29-k1 process

Chanha Park, Jeonkyu Lee, Kiho Yang, Shih-en Tseng, Young-Hong Min, Alek Chen, Hyunjo Yang, Donggyu Yim, Jinwoong Kim

Proc. SPIE. 6154, Optical Microlithography XIX

KEYWORDS: Lithography, Optical lithography, Polarization, Printing, Photomasks, Line width roughness, Optical proximity correction, Line edge roughness, Zirconium, Resolution enhancement technologies

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Proceedings Article | 10 May 2005 Paper

Abnormal patterning analysis using actual lens and illumination source data

Jongkyun Hong, Jeonkyu Lee, Eunsuk Kang, Hyunjo Yang, Donggyu Yim, James Guerrero, Rob Chung

Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX

KEYWORDS: Lithography, Monochromatic aberrations, Optical lithography, Lithographic illumination, Interferometers, Metals, Error analysis, Critical dimension metrology, Semiconducting wafers, Yield improvement

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Showing 5 of 6 publications

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