Dr. Jeonkyu Lee
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Data modeling, Calibration, Scanning electron microscopy, Time metrology, Neural networks, Optical proximity correction, Semiconducting wafers, Instrument modeling

Proceedings Article | 12 April 2013
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Cadmium, Photomasks, Extreme ultraviolet, Transistors, Optical proximity correction, Critical dimension metrology, Model-based design, 193nm lithography

Proceedings Article | 14 December 2009
Proc. SPIE. 7520, Lithography Asia 2009
KEYWORDS: Lithography, Data modeling, Polarization, Calibration, Image processing, Scanners, Transistors, Optical proximity correction, Semiconducting wafers, Process modeling

Proceedings Article | 24 March 2006
Proc. SPIE. 6152, Metrology, Inspection, and Process Control for Microlithography XX
KEYWORDS: Reticles, Metrology, Interferometers, Inspection, Control systems, Process control, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Fiber optic illuminators

Proceedings Article | 15 March 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Polarization, Printing, Photomasks, Line width roughness, Optical proximity correction, Line edge roughness, Zirconium, Resolution enhancement technologies

Showing 5 of 6 publications
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