Jeroen H. Lammers
at Philips Research Nederland BV
SPIE Involvement:
Author
Publications (8)

SPIE Journal Paper | April 1, 2008
JM3 Vol. 7 Issue 02
KEYWORDS: Line width roughness, Nanoimprint lithography, Electroluminescence, Diffusion, Photoresist materials, Absorbance, Extreme ultraviolet, Lithography, Photoresist processing, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Lithography, Diffusion, Electroluminescence, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Nanoimprint lithography, Modulation transfer functions, Photoresist processing

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Point spread functions, Diffusion, Electroluminescence, Photoresist materials, Convolution, Modulation transfer functions, Line edge roughness, Photoresist processing, Chemically amplified resists

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Lithography, Diffractive optical elements, Image resolution, Scanning electron microscopy, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness, Semiconducting wafers, Chemically amplified resists

SPIE Journal Paper | January 1, 2005
JM3 Vol. 4 Issue 01
KEYWORDS: Diffusion, Printing, Photoresist processing, Photoresist materials, Line edge roughness, Lithography, Critical dimension metrology, Cadmium sulfide, Binary data, Photomasks

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Optical spheres, Deep ultraviolet, Photons, Molecules, Diffusion, Quantum efficiency, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Line edge roughness

Showing 5 of 8 publications
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