Dr. Jérôme Belledent
Head of Computational Lithography Group at CEA-LETI
SPIE Involvement:
Publications (41)

Proceedings Article | 29 October 2014 Paper
Clyde Browning, Thomas Quaglio, Thiago Figueiro, Sébastien Pauliac, Jérôme Belledent, Aurélien Fay, Jessy Bustos, Jean-Christophe Marusic, Patrick Schiavone
Proceedings Volume 9235, 92350V (2014) https://doi.org/10.1117/12.2069335
KEYWORDS: Tolerancing, Lithography, Manufacturing, Vestigial sideband modulation, Photomasks, Data processing, Photoresist processing, Electron beam lithography, Printing, Photonic crystals

Proceedings Article | 17 October 2014 Paper
Proceedings Volume 9231, 92310Q (2014) https://doi.org/10.1117/12.2065840
KEYWORDS: Data modeling, Scanning electron microscopy, Photomasks, Optical proximity correction, Semiconducting wafers, Calibration, Neodymium, Mask making, Tolerancing, Directed self assembly

SPIE Journal Paper | 11 August 2014
Pieter Brandt, Jérôme Belledent, Céline Tranquillin, Thiago Figueiro, Stéfanie Meunier, Sébastien Bayle, Aurélien Fay, Matthieu Milléquant, Beatrice Icard, Marco Wieland
JM3, Vol. 13, Issue 03, 031306, (August 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.3.031306
KEYWORDS: Electron beam lithography, Electronic design automation, Critical dimension metrology, Raster graphics, Point spread functions, Semiconducting wafers, Lithography, Modulation, Optical proximity correction, Data conversion

Proceedings Article | 28 March 2014 Paper
A. Gharbi, R. Tiron, M. Argoud, X. Chevalier, J. Belledent, J. Pradelles, P. Pimenta Barros, C. Navarro, C. Nicolet, G. Hadziioannou, G. Fleury, S. Barnola
Proceedings Volume 9049, 90491N (2014) https://doi.org/10.1117/12.2046342
KEYWORDS: Critical dimension metrology, Optical lithography, Semiconducting wafers, Annealing, Scanning electron microscopy, Coating, Tolerancing, Lithography, Inspection, Directed self assembly

Proceedings Article | 28 March 2014 Paper
P. Brandt, J. Belledent, C. Tranquillin, T. Figueiro, S. Meunier, S. Bayle, A. Fay, M. Milléquant, B. Icard, M. Wieland
Proceedings Volume 9049, 904915 (2014) https://doi.org/10.1117/12.2046091
KEYWORDS: Electron beam lithography, Raster graphics, Nano opto mechanical systems, Point spread functions, Electronic design automation, Semiconducting wafers, Critical dimension metrology, Data conversion, Lithography, Deconvolution

Showing 5 of 41 publications
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