Dr. Jérôme Belledent
Head of Computational Lithography Group at CEA-LETI
SPIE Involvement:
Author
Publications (41)

PROCEEDINGS ARTICLE | October 29, 2014
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Photonic crystals, Printing, Data processing, Photomasks, Photoresist processing, Tolerancing, Vestigial sideband modulation

PROCEEDINGS ARTICLE | October 17, 2014
Proc. SPIE. 9231, 30th European Mask and Lithography Conference
KEYWORDS: Data modeling, Calibration, Scanning electron microscopy, Photomasks, Directed self assembly, Optical proximity correction, Mask making, Neodymium, Semiconducting wafers, Tolerancing

SPIE Journal Paper | August 11, 2014
JM3 Vol. 13 Issue 03
KEYWORDS: Electron beam lithography, Electronic design automation, Critical dimension metrology, Raster graphics, Point spread functions, Semiconducting wafers, Lithography, Modulation, Optical proximity correction, Data conversion

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Optical lithography, Annealing, Coating, Inspection, Scanning electron microscopy, Directed self assembly, Critical dimension metrology, Semiconducting wafers, Tolerancing

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Lithography, Electron beam lithography, Point spread functions, Nano opto mechanical systems, Deconvolution, Raster graphics, Critical dimension metrology, Data conversion, Semiconducting wafers, Electronic design automation

PROCEEDINGS ARTICLE | March 26, 2013
Proc. SPIE. 8680, Alternative Lithographic Technologies V
KEYWORDS: Lithography, Polymethylmethacrylate, Etching, Polymers, Oxygen, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Neodymium, 193nm lithography

Showing 5 of 41 publications
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