Dr. Jérome Depre
Senior Application Support Engineer
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 20 March 2020 Paper
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Metrology, Scanners, Critical dimension metrology, Overlay metrology

Proceedings Article | 13 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Diffraction, Metrology, Photons, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 28 March 2017 Paper
Proc. SPIE. 10145, Metrology, Inspection, and Process Control for Microlithography XXXI
KEYWORDS: Target detection, Semiconductors, Lithography, Diffraction, Metrology, Polarization, Etching, Materials processing, Scanning electron microscopy, Scatterometry, Time metrology, Data processing, Process control, Target acquisition, Commercial off the shelf technology, Overlay metrology

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Wafer-level optics, Diffraction, Optical design, Metrology, Cameras, Sensors, Scatterometry, Semiconducting wafers, Overlay metrology, Diffraction gratings

Proceedings Article | 18 April 2013 Paper
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Lithography, Reticles, Metrology, Metals, Scatterometry, Process control, Target recognition, Semiconducting wafers, Overlay metrology, Process modeling

Showing 5 of 10 publications
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