Dr. Jérôme Hazart
Comtutationnal Litho. Group Tech Coordinator at CEA-LETI
SPIE Involvement:
Publications (29)

Proceedings Article | 26 March 2019
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Electron beams, Calibration, Image processing, Silicon, 3D modeling, Image analysis, Atomic force microscopy, Scanning electron microscopy, 3D metrology, Semiconducting wafers

Proceedings Article | 20 March 2019
Proc. SPIE. 10962, Design-Process-Technology Co-optimization for Manufacturability XIII
KEYWORDS: Lithography, Edge detection, Data modeling, Calibration, Polymers, 3D modeling, Atomic force microscopy, Photoresist materials, Microlens, Computer aided design, Photoresist processing

Proceedings Article | 3 October 2018
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Lithography, Electron beam lithography, Data modeling, Calibration, Photonics, Photomasks, Beam shaping

Proceedings Article | 19 September 2018
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Metrology, Error analysis, Silicon, Diffusion, Electron microscopes, Scanning electron microscopy, Monte Carlo methods, Software development, Critical dimension metrology, Model-based design

Proceedings Article | 21 March 2017
Proc. SPIE. 10144, Emerging Patterning Technologies
KEYWORDS: Lithography, Polymethylmethacrylate, Polymers, Image processing, Inspection, Scanning electron microscopy, Directed self assembly, Immersion lithography, Picosecond phenomena, Semiconducting wafers

SPIE Journal Paper | 25 August 2016
JM3 Vol. 15 Issue 03
KEYWORDS: Directed self assembly, Annealing, Polymethylmethacrylate, Line width roughness, Picosecond phenomena, Semiconducting wafers, Lithography, Optical lithography, Image registration, Plasma

Showing 5 of 29 publications
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