Jerome Petit
at Commissariat à l'Energie Atomique
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Diffraction, Scattering, Silicon, Reflectivity, Fourier transforms, Spectroscopic ellipsometry, Double patterning technology, Fourier optics, Overlay metrology, Diffraction gratings

PROCEEDINGS ARTICLE | May 10, 2005
Proc. SPIE. 5752, Metrology, Inspection, and Process Control for Microlithography XIX
KEYWORDS: Diffraction, Metrology, Fourier transforms, Dielectrophoresis, Scatterometry, Line width roughness, Critical dimension metrology, Line edge roughness, Fourier optics, Diffraction gratings

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Diffraction, Sensors, Polarizers, Scanning electron microscopy, Photoresist materials, Spectroscopic ellipsometry, Specular reflections, Critical dimension metrology, CCD image sensors, Diffraction gratings

PROCEEDINGS ARTICLE | May 24, 2004
Proc. SPIE. 5375, Metrology, Inspection, and Process Control for Microlithography XVIII
KEYWORDS: Diffraction, Refractive index, Polarization, Reflection, Sensors, Silicon, Spectroscopic ellipsometry, Fourier optics, CCD image sensors, Diffraction gratings

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