Jerome Todeschini
at STMicroelectronics
SPIE Involvement:
Author
Publications (6)

SPIE Journal Paper | 1 July 2007
JM3 Vol. 6 Issue 03
KEYWORDS: Modulation, Critical dimension metrology, Electron beam direct write lithography, Point spread functions, Electron beam lithography, Cadmium sulfide, Electron beams, Optical lithography, Manufacturing, Backscatter

Proceedings Article | 6 May 2005
Proc. SPIE. 5751, Emerging Lithographic Technologies IX
KEYWORDS: Lithography, Optical lithography, Manufacturing, Photomasks, Optical proximity correction, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Optics manufacturing, Standards development

Proceedings Article | 4 May 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Semiconductors, Electron beam lithography, Electron beams, Etching, Coating, Manufacturing, Line width roughness, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers

Proceedings Article | 20 May 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Manufacturing, Control systems, Photomasks, Optical alignment, Electron beam direct write lithography, Photoresist processing, Semiconducting wafers, Optics manufacturing

Proceedings Article | 16 June 2003
Proc. SPIE. 5037, Emerging Lithographic Technologies VII
KEYWORDS: Electron beam lithography, Optical lithography, Scanners, Error analysis, Distortion, Photomasks, Optical alignment, Electron beam direct write lithography, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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