Mr. Jerome F. Wandell
at GLOBALFOUNDRIES Inc
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 23, 2016
Proc. SPIE. 9781, Design-Process-Technology Co-optimization for Manufacturability X
KEYWORDS: Semiconductors, Lithography, Photovoltaics, Optical lithography, Lithographic illumination, Etching, Manufacturing, Printing, Photomasks, Line width roughness, Double patterning technology, Logic devices, Optical proximity correction, SRAF, Analog electronics, Design for manufacturability

PROCEEDINGS ARTICLE | April 17, 2014
Proc. SPIE. 9048, Extreme Ultraviolet (EUV) Lithography V
KEYWORDS: Lithography, Etching, Atomic layer deposition, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Double patterning technology, Line edge roughness, Photoresist processing, Resist chemistry

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