Dr. Jeromy Todd Hollenshead
at Sandia National Labs
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 20, 2004
Proc. SPIE. 5374, Emerging Lithographic Technologies VIII
KEYWORDS: Mathematical modeling, Carbon, Contamination, Data modeling, Photons, Molecules, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, EUV optics

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