Mr. Jerry Cullins
Sr. Member of Technical Staff at HOYA Corp
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 16, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Cadmium, Image processing, Computer simulations, Transmission electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Sputter deposition, Interfaces, Silicon, Reflectivity, Surface roughness, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

PROCEEDINGS ARTICLE | March 15, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Statistical analysis, Coating, Chromium, Atomic force microscopy, Printing, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Argon, Chemical species, Sputter deposition, Interfaces, Silicon, Reflectivity, Transmission electron microscopy, Ion beams, Extreme ultraviolet, Molybdenum

PROCEEDINGS ARTICLE | March 23, 2006
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Etching, Sputter deposition, Ions, Manufacturing, Atomic force microscopy, Transmission electron microscopy, Ion beams, Photomasks, Extreme ultraviolet lithography, Deposition processes

PROCEEDINGS ARTICLE | September 14, 2001
Proc. SPIE. 4346, Optical Microlithography XIV
KEYWORDS: Lithography, Reticles, Contamination, Silica, Polymers, Manufacturing, Distortion, Oxygen, Pellicles, Photomasks

Showing 5 of 8 publications
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