Jerry Cullins
Sr. Member of Technical Staff at HOYA Corp
SPIE Involvement:
Author
Publications (8)

Proceedings Article | 16 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Cadmium, Image processing, Computer simulations, Transmission electron microscopy, Printing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Critical dimension metrology, Photoresist processing

Proceedings Article | 15 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Sputter deposition, Interfaces, Silicon, Reflectivity, Surface roughness, Atomic force microscopy, Ion beams, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography

Proceedings Article | 15 March 2007 Paper
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Statistical analysis, Coating, Chromium, Atomic force microscopy, Printing, Bridges, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Argon, Chemical species, Sputter deposition, Interfaces, Silicon, Reflectivity, Transmission electron microscopy, Ion beams, Extreme ultraviolet, Molybdenum

Proceedings Article | 23 March 2006 Paper
Proc. SPIE. 6151, Emerging Lithographic Technologies X
KEYWORDS: Etching, Sputter deposition, Ions, Manufacturing, Atomic force microscopy, Transmission electron microscopy, Ion beams, Photomasks, Extreme ultraviolet lithography, Deposition processes

Showing 5 of 8 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top