Dr. Jerzy R. Hoffman Profile

Dr. Jerzy R. Hoffman

Scientist at Cymer LLC

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Author

Publications (13)

SPIE Journal Paper | 1 October 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3, Vol. 8, Issue 04, 041504, (October 2009) https://doi.org/10.1117/12.10.1117/1.3224942

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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Proceedings Article | 18 March 2009 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, David Brandt, Alexander Bykanov, Alex Ershov, William Partlo, Dave Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727138 (2009) https://doi.org/10.1117/12.814272

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Extreme ultraviolet lithography, Sensors, Carbon dioxide lasers, Mirrors, Tin, Coating, Light sources

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Proceedings Article | 18 March 2009 Open Access

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727103 (2009) https://doi.org/10.1117/12.814228

KEYWORDS: Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Mirrors, Tin, Plasma, Coating, Scanners, Manufacturing, Light sources

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Proceedings Article | 4 December 2008 Paper

Laser-produced plasma source system development

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7140, 71401E (2008) https://doi.org/10.1117/12.806648

KEYWORDS: Extreme ultraviolet, Plasma, Reflectivity, Mirrors, Extreme ultraviolet lithography, Tin, Plasma systems, Manufacturing, Light sources, Carbon dioxide lasers

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This paper provides a review of development progress for a laser-produced-plasma (LPP) extreme-ultra-violet (EUV) source with performance goals targeted to meet joint requirements from all leading scanner manufacturers. Laser produced plasma systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. Recent advances in the development of the system, its present average output power level and progress with various subcomponents is discussed. We present the latest results on peak EUV and average EUV power as well as stability of EUV output, measured in burst-mode operation at the nominal repetition rate of the light source. In addition, our progress in developing of critical components, such as normal-incidence EUV collector and liquid-target delivery system is described. We also report on dose stability, plasma position stability and EUV distribution at the output region of the source. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source. The capability to scale LPP power by further development of the high power CO2 drive laser in order to increase duty cycle and duration of continuous light source operation is shown. Production systems with thermal management and capable of 5 sr light collection are being assembled and tested. A description of the development of a normal-incidence ellipsoidal collector is included. Improvements in substrate quality lead to increased EUV reflectance of the mirror. Results on the generation of liquid tin droplets as target material for efficient plasma generation are also described. The droplet generator serves as a key element in the precise and spatially stable delivery of small quantities of liquid tin at high repetition rates. We describe a protection module at the intermediate focus (IF) region of the source and imaging of the EUV distribution using a sub-aperture collector and a fluorescent screen. A path to meet requirements for production scanners planned well into the next decade is also presented.

Proceedings Article | 21 March 2007 Paper

Laser-produced plasma source system development

Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proceedings Volume 6517, 65173J (2007) https://doi.org/10.1117/12.713454

KEYWORDS: Extreme ultraviolet, Ions, Gas lasers, Plasma, Tin, Spectroscopy, Carbon monoxide, Extreme ultraviolet lithography, Calibration, Sensors

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This paper describes the development of laser produced plasma (LPP) technology as an EUV source for advanced scanner lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for critical layer patterning below 32 nm beginning with beta generation scanners in 2009. This paper describes the development status of subsystems most critical to the performance to meet joint scanner manufacturer requirements and semiconductor industry standards for reliability and economic targets for cost of ownership. The intensity and power of the drive laser are critical parameters in the development of extreme ultraviolet LPP lithography sources. The conversion efficiency (CE) of laser light into EUV light is strongly dependent on the intensity of the laser energy on the target material at the point of interaction. The total EUV light generated then scales directly with the total incident laser power. The progress on the development of a short pulse, high power CO2 laser for EUV applications is reported. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. The deposition of target materials and contaminants, as well as sputtering of the collector multilayer coating and implantation of incident particles can reduce the reflectivity of the mirror substantially over the exposure time even though debris mitigation schemes are being employed. The results of measurements of high energy ions generated by a short-pulse CO2 laser on a laser-produced plasma EUV light source with Sn target are presented. Droplet generation is a key element of the LPP source being developed at Cymer for EUV lithography applications. The main purpose of this device is to deliver small quantities of liquid target material as droplets to the laser focus. The EUV light in such configuration is obtained as a result of creating a highly ionized plasma from the material of the droplets. Liquid tin is the material of choice to be used as a target due to the relatively high CE of the laser energy into in-band EUV radiation. Results obtained with the droplet generator and technical challenges related to successful implementation of the device are discussed.

Proceedings Article | 19 March 2007 Paper

LPP EUV source development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proceedings Volume 6517, 65170Q (2007) https://doi.org/10.1117/12.713279

KEYWORDS: Extreme ultraviolet, Gas lasers, Plasmas, Tin, Mirrors, Reflectivity, Extreme ultraviolet lithography, Carbon monoxide, Ions, Scanners

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Proceedings Article | 24 March 2006 Paper

High-power low cost drive laser for LPP source

Igor Fomenkov, Björn Hansson, Norbert Böwering, Alex Ershov, William Partlo, Vladimir Fleurov, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas L., Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61513X (2006) https://doi.org/10.1117/12.655733

KEYWORDS: Gas lasers, Molybdenum, Carbon monoxide, Optical amplifiers, Laser applications, Neodymium lasers, Oscillators, Extreme ultraviolet, Excimer lasers, High power lasers

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We report on the approach for a high-power high-beam-quality drive laser system that is used for a laser-produced plasma (LPP) EUV source. Cymer has conducted research on a number of solutions for a multi-kW drive laser system that satisfy high volume production requirements. Types of lasers to be presented include XeF at 351 nm and CO₂ at 10.6 micron. We report on a high efficiency XeF amplifier with a 3rd harmonic Nd:YLF master oscillator operated in the 6 to 8 kHz range and a CO₂ laser system with Q-switched cavity dumped master oscillator and RF pumped fast axial flow amplifiers operated in the 10 to 100 kHz range. CO₂ laser short pulse gain and optical isolation techniques are reported. Optical performance data and design features of the drive laser system are discussed, as well as a path to achieve output power scaling to meet high volume manufacturing (HVM) requirements and beyond. Additionally, the electrical efficiency as a component of cost of operation is presented. Development of a drive laser with sufficient output power, high beam quality, and economical cost of operation is critical to the successful implementation of a laser-produced-plasma (LPP) EUV source for HVM applications. Cymer has conducted research on a number of solutions to this critical need. We report our progress on development of a high power system with two gas-discharge power amplifiers to produce high output power with high beam quality. We provide optical performance data and design features of the drive laser as well as a path to output power scaling to meet HVM requirements. Development of a drive laser for LPP EUV source is a challenging task. It requires multi-kW laser output power with short pulse duration and diffraction limited beam quality. In addition, this system needs to be very reliable and cost-efficient to satisfy industry requirements for high volume integrated circuit manufacturing. Feasibility studies of high power laser solutions that utilize proven laser technologies in high power optical gain modules and deliver required beam properties have been performed and are reported.

Proceedings Article | 23 March 2006 Paper

LPP EUV source development for HVM

Björn Hansson, Igor Fomenkov, Norbert Böwering, Alex Ershov, William Partlo, David Myers, Oleh Khodykin, Alexander Bykanov, Curtis Rettig, Jerzy Hoffman, Ernesto Vargas, Rod Simmons, Juan Chavez, William Marx, David Brandt

Proceedings Volume 6151, 61510R (2006) https://doi.org/10.1117/12.656687

KEYWORDS: Extreme ultraviolet, Tin, Plasma, Lithium, Extreme ultraviolet lithography, Mirrors, Ions, Prototyping, Reflectivity, Metrology

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Proceedings Article | 10 May 2005 Paper

Metrology of laser-produced plasma light source for EUV lithography

N. Boewering, J. Hoffman, O. Khodykin, C. Rettig, B. Hansson, A. Ershov, I. Fomenkov

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600809

KEYWORDS: Extreme ultraviolet, Plasma, Metrology, Mirrors, Sensors, Tin, Optical filters, Spectroscopy, Lithium, Photodiodes

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Proceedings Article | 6 May 2005 Paper

LPP EUV conversion efficiency optimization

J. Hoffman, A. Bykanov, O. Khodykin, A. Ershov, I. Fomenkov, W. Partlo, D. Myers

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601048

KEYWORDS: Tin, Extreme ultraviolet, Lithium, Plasma, Pulsed laser operation, Laser energy, Spectroscopy, Light, CCD cameras, Image analysis

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Proceedings Article | 6 May 2005 Paper

Protection of collector optics in an LPP based EUV source

C. Rettig, O. Khodykin, J. Hoffman, W. Marx, N. Bowering, E. Vargas, A. Ershov, I. Fomenkov, W. Partlo

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.601517

KEYWORDS: Ions, Lithium, Mirrors, Extreme ultraviolet lithography, Reflectivity, Plasma, Extreme ultraviolet, EUV optics, Tin, Diffusion

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Proceedings Article | 20 May 2004 Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Boewering, Curtis Rettig, Jerzy Hoffman

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538690

KEYWORDS: Electrodes, Plasma, Extreme ultraviolet, Xenon, Tin, Light sources, Extreme ultraviolet lithography, Magnetism, Carbon, Contamination

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Proceedings Article | 16 June 2003 Paper

Performance and scaling of a dense plasma focus light source for EUV lithography

Igor Fomenkov, Richard Ness, Ian Oliver, Stephan Melnychuk, Oleh Khodykin, Norbert Bowering, Curtis Rettig, Jerzy Hoffman

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.505303

KEYWORDS: Extreme ultraviolet, Plasma, Electrodes, Xenon, Light sources, Extreme ultraviolet lithography, Mirrors, Zirconium, Lithography, Metrology

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Showing 5 of 13 publications

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