Dr. Jerzy R. Hoffman
Scientist at Cymer LLC
SPIE Involvement:
Author
Publications (13)

SPIE Journal Paper | October 1, 2009
JM3 Vol. 8 Issue 04
KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Light sources, Sensors, Ions, Coating, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | March 18, 2009
Proc. SPIE. 7271, Alternative Lithographic Technologies
KEYWORDS: Mirrors, Light sources, Scanners, Coating, Manufacturing, Reflectivity, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Tin

PROCEEDINGS ARTICLE | December 4, 2008
Proc. SPIE. 7140, Lithography Asia 2008
KEYWORDS: Mirrors, Light sources, Manufacturing, Reflectivity, Carbon dioxide lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Plasma systems, Plasma, Tin

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Sensors, Calibration, Spectroscopy, Ions, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Plasma, Tin

PROCEEDINGS ARTICLE | March 19, 2007
Proc. SPIE. 6517, Emerging Lithographic Technologies XI
KEYWORDS: Mirrors, Scanners, Ions, Plasmas, Reflectivity, Gas lasers, Extreme ultraviolet, Extreme ultraviolet lithography, Carbon monoxide, Tin

Showing 5 of 13 publications
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