Ms. Jesline Ang
at KLA-Tencor Singapore
SPIE Involvement:
Author
Publications (2)

PROCEEDINGS ARTICLE | March 19, 2015
Proc. SPIE. 9424, Metrology, Inspection, and Process Control for Microlithography XXIX
KEYWORDS: Target detection, Semiconductors, Optical filters, Metrology, Detection and tracking algorithms, Calibration, Inspection, Scanning electron microscopy, Precision measurement, Overlay metrology

PROCEEDINGS ARTICLE | April 10, 2013
Proc. SPIE. 8681, Metrology, Inspection, and Process Control for Microlithography XXVII
KEYWORDS: Semiconductors, Optical lithography, Data modeling, Scanners, Process control, Optical alignment, Semiconducting wafers, Performance modeling, Overlay metrology, Process modeling

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