Jetske K. Stortelder
Research Scientist at TNO
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 26 September 2019
Proc. SPIE. 11147, International Conference on Extreme Ultraviolet Lithography 2019
KEYWORDS: Mirrors, Contamination, Pellicles, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Ruthenium, Temperature metrology

Proceedings Article | 26 March 2019
Proc. SPIE. 10957, Extreme Ultraviolet (EUV) Lithography X
KEYWORDS: Reticles, Contamination, Ions, Hydrogen, Extreme ultraviolet, Chemical analysis, Extreme ultraviolet lithography, Tantalum, Ruthenium, Plasma

Proceedings Article | 23 March 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Carbon, Reticles, Contamination, Argon, Particles, Scanning electron microscopy, Extreme ultraviolet, Semiconducting wafers, Plasma, Liquids

Proceedings Article | 14 October 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Contamination, Particles, Reliability, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Instrument modeling

Proceedings Article | 8 April 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Contamination, Particles, Inspection, Inspection equipment, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Fiber optic handling equipment

Showing 5 of 6 publications
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