Jetske Stortelder
Research Scientist at TNO
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | March 23, 2012
Proc. SPIE. 8322, Extreme Ultraviolet (EUV) Lithography III
KEYWORDS: Carbon, Reticles, Contamination, Argon, Particles, Scanning electron microscopy, Extreme ultraviolet, Semiconducting wafers, Plasma, Liquids

PROCEEDINGS ARTICLE | October 14, 2011
Proc. SPIE. 8166, Photomask Technology 2011
KEYWORDS: Lithography, Reticles, Contamination, Particles, Reliability, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Instrument modeling

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Lithography, Reticles, Contamination, Particles, Inspection, Inspection equipment, Extreme ultraviolet, Extreme ultraviolet lithography, Particle contamination, Fiber optic handling equipment

PROCEEDINGS ARTICLE | April 8, 2011
Proc. SPIE. 7969, Extreme Ultraviolet (EUV) Lithography II
KEYWORDS: Signal to noise ratio, Reticles, Image processing, Scanners, Particles, Chromium, Photomasks, Extreme ultraviolet, Semiconducting wafers, Signal detection

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