CONFERENCE PROCEEDINGS
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Jeung-woo Lee
at Semiconductor Leading Edge Technologies Inc
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Publications (4)
Proceedings Article | 11 April 2006 Paper
Analysis of 193nm immersion specific defects
Akihiko Otoguro, Jeung-Woo Lee, Toshiro Itani, Kiyoshi Fujii, Tomohiro Funakoshi, Tsunehiro Sakai, Kenji Watanabe, Mikio Arakawa, Hitoshi Nakano, Masamichi Kobayashi
Proceedings Volume 6153, 61531P (2006) https://doi.org/10.1117/12.656086
KEYWORDS: Photoresist processing, Bridges, Semiconducting wafers, Scanning electron microscopy, Photography, Immersion lithography, Thin film coatings, Lithography, Crystals, Quartz
Proceedings Article | 21 March 2006 Paper
Full-field exposure tools for ArF immersion lithography
Proceedings Volume 6154, 61544I (2006) https://doi.org/10.1117/12.656130
KEYWORDS: Semiconducting wafers, Resonance energy transfer, Standards development, Immersion lithography, Water, Lithography, Optical lithography, Photoresist processing, Photomasks, Microfluidics
Proceedings Article | 12 May 2005 Paper
Fabrication of sub 45 nm random patterns through centerline phase-shifting mask (CL-PSM)
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599309
KEYWORDS: Phase shifts, Photomasks, Nanoimprint lithography, Chromium, Lithography, Resolution enhancement technologies, Binary data, Optical lithography, Logic, Fluorine
Proceedings Article | 28 May 2004 Paper
157-nm lithography with extremely high numerical aperture lens for 45-nm technology node
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535119
KEYWORDS: Nanoimprint lithography, Line edge roughness, Lithography, Photomasks, Tolerancing, Phase shifting, Binary data, Objectives, Resolution enhancement technologies, Lithographic illumination
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