Jeung-woo Lee
at Semiconductor Leading Edge Technologies Inc
SPIE Involvement:
Author
Publications (4)

PROCEEDINGS ARTICLE | April 11, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Lithography, Quartz, Crystals, Photography, Scanning electron microscopy, Bridges, Immersion lithography, Thin film coatings, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Microfluidics, Optical lithography, Water, Photomasks, Resonance energy transfer, Immersion lithography, Photoresist processing, Semiconducting wafers, Standards development

PROCEEDINGS ARTICLE | May 28, 2004
Proc. SPIE. 5377, Optical Microlithography XVII
KEYWORDS: Lithography, Phase shifting, Lithographic illumination, Objectives, Photomasks, Nanoimprint lithography, Line edge roughness, Tolerancing, Binary data, Resolution enhancement technologies

PROCEEDINGS ARTICLE | May 12, 2004
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Logic, Optical lithography, Chromium, Photomasks, Nanoimprint lithography, Fluorine, Binary data, Resolution enhancement technologies, Phase shifts

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