Jhen-Cyuan Li
at Shanghai Huali Integrated Circuit Corp.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 20 March 2020
Proc. SPIE. 11325, Metrology, Inspection, and Process Control for Microlithography XXXIV
KEYWORDS: Deep ultraviolet, Fin field effect transistors, Electro optical systems calibration, Calibration, Etching, Electron microscopes, Scanning electron microscopy, Transmission electron microscopy, Image quality, Precision measurement, Image filtering, Integrated circuits, Semiconducting wafers, 193nm lithography, Accuracy assessment

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