Prof. Ji-Eun Lee
at Hanyang Univ
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | March 21, 2007
Proc. SPIE. 6519, Advances in Resist Materials and Processing Technology XXIV
KEYWORDS: Semiconductors, Thin films, Lithography, Glasses, Chemistry, Physics, Computer simulations, Photoresist materials, Applied physics, Photoresist processing

PROCEEDINGS ARTICLE | March 29, 2006
Proc. SPIE. 6153, Advances in Resist Technology and Processing XXIII
KEYWORDS: Mathematical modeling, Thin films, Lithography, Glasses, Interfaces, Optical proximity correction, Critical dimension metrology, Motion models, Photoresist processing, Resolution enhancement technologies

PROCEEDINGS ARTICLE | March 21, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Semiconductors, Diffraction, Refractive index, Finite-difference time-domain method, Lithographic illumination, Polarization, Silicon, Photomasks, Immersion lithography, Binary data

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Lithographic illumination, Scattering, Chromium, Electroluminescence, Photomasks, Optical proximity correction, Binary data, Resolution enhancement technologies, Phase shifts

PROCEEDINGS ARTICLE | June 28, 2005
Proc. SPIE. 5853, Photomask and Next-Generation Lithography Mask Technology XII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

PROCEEDINGS ARTICLE | May 4, 2005
Proc. SPIE. 5753, Advances in Resist Technology and Processing XXII
KEYWORDS: Optical properties, Polymers, Diffusion, Photoresist materials, Photomasks, Absorbance, Critical dimension metrology, Line edge roughness, Photoresist processing, Semiconducting wafers

Showing 5 of 8 publications
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