Dr. Ji Hoon Na
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Publications (24)

Proceedings Article | 16 October 2017 Presentation
Proceedings Volume 10451, 104510I (2017) https://doi.org/10.1117/12.2280687
KEYWORDS: Extreme ultraviolet, Photomasks, Pellicles, Inspection, Extreme ultraviolet lithography, High volume manufacturing, Scanners, Transmittance

Proceedings Article | 28 March 2017 Presentation + Paper
Jihoon Na, Donggun Lee, Changhwan Do, Hong-seok Sim, Jung-Hwan Lee, Jungyoup Kim, Hwan-Seok Seo, Heebom Kim, Chan Uk Jeon
Proceedings Volume 10145, 101450M (2017) https://doi.org/10.1117/12.2257390
KEYWORDS: Photomasks, Extreme ultraviolet, Imaging systems, Extreme ultraviolet lithography, Airborne remote sensing, Inspection, Line width roughness, High volume manufacturing, Lead, Metrology, Semiconducting wafers, Scanning electron microscopy, SRAF, Binary data, EUV optics, Mirrors

Proceedings Article | 24 March 2017 Open Access Presentation + Paper
Seong-Sue Kim, Roman Chalykh, Hoyeon Kim, Seungkoo Lee, Changmin Park, Myungsoo Hwang, Joo-On Park, Jinhong Park, Hocheol Kim, Jinho Jeon, Insung Kim, Donggun Lee, Jihoon Na, Jungyeop Kim, Siyong Lee, Hyunwoo Kim, Seok-Woo Nam
Proceedings Volume 10143, 1014306 (2017) https://doi.org/10.1117/12.2264043
KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Extreme ultraviolet, Pellicles, Photomasks, Transmittance, Logic, Scanners, Reticles, Chemical elements

Proceedings Article | 18 March 2016 Paper
Mun Ja Kim, Hwan Chul Jeon, Roman Chalykh, Eokbong Kim, Jihoon Na, Byung-Gook Kim, Heebom Kim, Chanuk Jeon, Seul-Gi Kim, Dong-Wook Shin, Taesung Kim, Sooyoung Kim, Jung Hun Lee, Ji-Beom Yoo
Proceedings Volume 9776, 97761Z (2016) https://doi.org/10.1117/12.2218228
KEYWORDS: Extreme ultraviolet lithography, Pellicles, Silicon, Extreme ultraviolet, Graphene, Crystals, Transmittance, Silicon films, Thin films, Lithography, Hydrogen, Infrared lasers, Thermography

Proceedings Article | 28 June 2013 Paper
Jihoon Na, Sang Hoon Han, Gisung Yoon, Dong Hoon Chung, Byung-Gook Kim, Chanuk Jeon, Dana Bernstein, Lior Shoval, Ido Dolev, Ofer Shopen, Ju Sang Lee, Chung ki Lyu, Seung Ryong Bae
Proceedings Volume 8701, 870115 (2013) https://doi.org/10.1117/12.2032774
KEYWORDS: Photomasks, Inspection, Printing, Deep ultraviolet, Signal to noise ratio, Defect detection, Semiconducting wafers, Optical inspection, Wafer-level optics, Geometrical optics

Showing 5 of 24 publications
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