Mr. Ji-Suk Hong
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Lithographic DFM , Statistical variability modeling , OPC , Memory cell fail rate modeling
Publications (11)

PROCEEDINGS ARTICLE | March 20, 2018
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Semiconductors, Electronics, Optical lithography, Graphics processing units, Computer simulations, Optical proximity correction, Tolerancing, Communication engineering

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Surface plasmons, Optical lithography, Statistical analysis, Error analysis, Manufacturing, Resistance, Monte Carlo methods, Process control, Critical dimension metrology, Overlay metrology

PROCEEDINGS ARTICLE | March 13, 2009
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Image quality, Photomasks, Image enhancement, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

PROCEEDINGS ARTICLE | May 14, 2007
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Data modeling, Data processing, Finite element methods, Design for manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Process modeling

PROCEEDINGS ARTICLE | March 20, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Optical lithography, Data modeling, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Model-based design, Instrument modeling, Algorithms

PROCEEDINGS ARTICLE | March 15, 2006
Proc. SPIE. 6154, Optical Microlithography XIX
KEYWORDS: Lithography, Data modeling, Calibration, Image processing, Scanning electron microscopy, Image enhancement, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Instrument modeling

Showing 5 of 11 publications
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