Ji-Suk Hong
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Area of Expertise:
Lithographic DFM , Statistical variability modeling , OPC , Memory cell fail rate modeling
Publications (13)

Proceedings Article | 1 May 2023 Presentation + Paper
Proceedings Volume 12499, 124990C (2023) https://doi.org/10.1117/12.2657880
KEYWORDS: Etching, Data modeling, Modeling, Machine learning, Design and modelling, Statistical modeling, Optical proximity correction, Reflection, Feature extraction, Artificial intelligence

Proceedings Article | 20 March 2019 Presentation + Paper
Woojoo Sim, Kibok Lee, Dingdong Yang, Jaeseung Jeong, Ji-Suk Hong, Sooryong Lee, Honglak Lee
Proceedings Volume 10961, 1096105 (2019) https://doi.org/10.1117/12.2514884
KEYWORDS: Lithography, Photomasks, Neural networks, Data modeling, Process modeling, Image classification, Binary data, Image processing, Computational lithography

Proceedings Article | 20 March 2018 Presentation + Paper
Heejun Lee, Sangwook Kim, Jisuk Hong, Sooryong Lee, Hwansoo Han
Proceedings Volume 10587, 105870P (2018) https://doi.org/10.1117/12.2295696
KEYWORDS: Optical proximity correction, Computer simulations, Semiconductors, Optical lithography, Tolerancing, Electronics, Communication engineering, Graphics processing units

Proceedings Article | 13 March 2009 Paper
Yong-Hee Park, Dong-Hyun Kim, Jung-Hoe Choi, Ji-Suk Hong, Chul-Hong Park, Sang-Hoon Lee, Moon-Hyun Yoo, Jun-Dong Cho
Proceedings Volume 7275, 72750P (2009) https://doi.org/10.1117/12.811840
KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Calibration, Optical lithography, Nanoimprint lithography, Image quality, Photomasks, Semiconductors, Image enhancement

Proceedings Article | 13 March 2009 Paper
Yu-Jin Pyo, Dae-Wook Kim, Jai-Kyun Park, Ji-Seong Doh, Hyun-Jae Kang, Ji-Suk Hong, Chul-Hong Park, Sang-Hoon Lee, Moon-Hyun Yoo
Proceedings Volume 7275, 72751L (2009) https://doi.org/10.1117/12.815341
KEYWORDS: Overlay metrology, Surface plasmons, Critical dimension metrology, Statistical analysis, Manufacturing, Resistance, Error analysis, Monte Carlo methods, Optical lithography, Process control

Showing 5 of 13 publications
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