Ji Young Lee
Sr Application Engineer at Mentor Korea Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2011
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Electroluminescence, Scanning electron microscopy, Photomasks, Optical proximity correction, SRAF, Mask making, Semiconducting wafers, Wafer testing, Performance modeling

Proceedings Article | 29 September 2010
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Lithography, Optical lithography, Lithographic illumination, Metals, Image processing, Manufacturing, Photomasks, Optical proximity correction, Model-based design, Instrument modeling

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