Ji-young Lee
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)

PROCEEDINGS ARTICLE | May 14, 2004
Proc. SPIE. 5376, Advances in Resist Technology and Processing XXI
KEYWORDS: Lithography, Spatial frequencies, Etching, Photoresist materials, Line width roughness, Transistors, Critical dimension metrology, Line edge roughness, Semiconducting wafers, Failure analysis

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