Ji Li
at Synopsys Inc
SPIE Involvement:
Publications (5)

Proceedings Article | 10 April 2024 Presentation
Proceedings Volume 12954, 1295413 (2024) https://doi.org/10.1117/12.3014637
KEYWORDS: Photomasks, Deep ultraviolet, Optical proximity correction, Extreme ultraviolet lithography, Ecosystems, Lithography, Extreme ultraviolet, Yield improvement, Source mask optimization, Printing

Proceedings Article | 26 May 2022 Presentation + Paper
Rainer Zimmermann, Luis Orbe, Bernd Küchler, Ji Li, Jim Burdorf, William Stanton, Tung-Yu Su, Remco Stoffer, Ulrich Klostermann, Wolfgang Demmerle
Proceedings Volume 12148, 1214809 (2022) https://doi.org/10.1117/12.2620724
KEYWORDS: Optical proximity correction, Photomasks, Waveguides, Photonic devices, Lithography, Line edge roughness, Stochastic processes, Photonics, Signal to noise ratio

Proceedings Article | 10 March 2010 Paper
Proceedings Volume 7640, 76401W (2010) https://doi.org/10.1117/12.848443
KEYWORDS: Atrial fibrillation, Optical proximity correction, Photomasks, Model-based design, Cadmium sulfide, Critical dimension metrology, Manufacturing, Printing, 3D modeling, Solids

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71223Z (2008) https://doi.org/10.1117/12.801593
KEYWORDS: Optical proximity correction, Atrial fibrillation, Lithography, Lithographic illumination, Manufacturing, Resolution enhancement technologies, Optical lithography, Process modeling, Semiconductors, Semiconducting wafers

Proceedings Article | 4 March 2008 Paper
Proceedings Volume 6925, 69251H (2008) https://doi.org/10.1117/12.773059
KEYWORDS: Optical proximity correction, Diffractive optical elements, Atrial fibrillation, Critical dimension metrology, Resolution enhancement technologies, Lithography, Error analysis, Head, Bridges, Process modeling

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