Dr. Ji Xu
Data Scientist at Motivo, Inc
SPIE Involvement:
Author
Publications (8)

PROCEEDINGS ARTICLE | April 3, 2017
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Analytics, Lithography, Metrology, Statistical analysis, Databases, Pattern recognition, Manufacturing, Computer simulations, Machine learning, Integrated circuits, Computational lithography, Optical proximity correction, Integrated circuit design, Product engineering, Yield improvement, Design for manufacturability

PROCEEDINGS ARTICLE | March 26, 2015
Proc. SPIE. 9427, Design-Process-Technology Co-optimization for Manufacturability IX
KEYWORDS: Statistical analysis, Data modeling, Metals, Manufacturing, Design for manufacturing, Image classification, Raster graphics, Optimization (mathematics), Current controlled current source, Design for manufacturability

PROCEEDINGS ARTICLE | April 2, 2014
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Super resolution, Image processing, Image resolution, Distortion, Scanning electron microscopy, Image quality, Image enhancement, Semiconducting wafers, Lawrencium

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9049, Alternative Lithographic Technologies VI
KEYWORDS: Optical lithography, Polymethylmethacrylate, Atrial fibrillation, Roentgenium, Etching, Polymers, Molecules, Computer simulations, Monte Carlo methods, Directed self assembly

PROCEEDINGS ARTICLE | March 28, 2014
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Lithography, Optical lithography, Etching, Metals, Photons, Directed self assembly, Double patterning technology, Semiconducting wafers, Plasma, Back end of line

PROCEEDINGS ARTICLE | March 27, 2014
Proc. SPIE. 9051, Advances in Patterning Materials and Processes XXXI
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Annealing, Scanning electron microscopy, Photoresist materials, Line width roughness, Directed self assembly, Picosecond phenomena, Line edge roughness

Showing 5 of 8 publications
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