Dr. Jian Yin
at EMD Performance Materials Corp
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 25 March 2016 Paper
Proc. SPIE. 9779, Advances in Patterning Materials and Processes XXXIII
KEYWORDS: Optical lithography, Etching, Polymers, Annealing, Silicon, Scanning electron microscopy, Directed self assembly, Line edge roughness, Photomicroscopy, Semiconducting wafers

Proceedings Article | 22 March 2016 Paper
Proc. SPIE. 9777, Alternative Lithographic Technologies VIII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymethylmethacrylate, Cadmium, Materials processing, Manufacturing, Photoresist materials, Process control, Directed self assembly, Plasma etching, Critical dimension metrology, Polymer thin films

Proceedings Article | 20 March 2015 Paper
Proc. SPIE. 9425, Advances in Patterning Materials and Processes XXXII
KEYWORDS: Lithography, Electron beam lithography, Optical lithography, Polymethylmethacrylate, Etching, Photoresist materials, Directed self assembly, Plasma etching, Extreme ultraviolet lithography, Plasma

Proceedings Article | 19 March 2015 Paper
Proc. SPIE. 9423, Alternative Lithographic Technologies VII
KEYWORDS: Optical lithography, Polymethylmethacrylate, Etching, Line width roughness, Directed self assembly, Plasma etching, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Proceedings Article | 2 April 2014 Paper
Proc. SPIE. 9050, Metrology, Inspection, and Process Control for Microlithography XXVIII
KEYWORDS: Metrology, Polymethylmethacrylate, Data modeling, Scatterometry, Bridges, Directed self assembly, Picosecond phenomena, Critical dimension metrology, Line edge roughness, Semiconducting wafers

Showing 5 of 9 publications
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